High power magnetron sputtering techniques have become essential tools in the deposition of advanced thin films. By utilising high power pulses, these methods generate highly ionised plasmas that ...
Trikon Technologies and Eco-Snow Systems have developed a sputtering technique for producing GaAs and other compound semiconductor devices The process has the potential to increase productivity for ...
Growth temperature is a critical parameter determining the sheet carrier density of scandium aluminum nitride (ScAlN)-based heterostructures, grown using the sputtering technique. Gallium nitride (GaN ...
Tokyo, Japan - Researchers from Tokyo Metropolitan University have used high power impulse magnetron scattering (HiPIMS) to create thin films of tungsten with unprecedentedly low levels of film stress ...
There has been significant research into the practical uses of tin oxide (SnO 2), particularly in applications such as transparent electrodes, electromagnetic shielding, n-type thin-film transistor ...
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